
Welcome to the Nitride Materials and Devices Group!
Our Research
At the Nitride Materials and Devices Group, we pioneer the development of ferroelectric and functional nitrides to enable next-generation electronic and optoelectronic devices. Our research spans thin-film synthesis, material characterization, and device fabrication, with applications in RF and power electronics, optoelectronics, and acoustics.
Led by Professor Joseph Casamento, we use advanced sputter deposition to explore novel nitride semiconductors, pushing the boundaries of ferroelectricity, high-speed transistors, and integrated device architectures. By combining experimental synthesis, theoretical modeling, and fabrication, we bridge fundamental materials discovery with real-world applications in semiconductors.
If you are interested in joining our efforts or collaborating, please reach out!
Research Overview

Epitaxial Growth
Using our custom sputtering deposition system, we explore novel nitrides chemistries.

Heterogeneous Integration
Leveraging MIT.nano facilities, we fabricate the future of nitride devices.